CYCLIC ORGANOAMINOSILANE PRECURSORS FOR FORMING SILICON-CONTAINING FILMS AND METHODS OF USING THE SAME
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
N/A
Issued Date -
Oct 27, 2016
app pub date -
Jun 30, 2016
filing date -
Jun 30, 2016
priority date (Note) -
Published
status (Latency Note)
Importance
Loading Importance Indicators... 
Abstract
Disclosed are methods for forming a silicon-containing layer on a substrate, the method comprising the steps of introducing into a reactor containing a substrate a vapor including an Si-containing film forming composition having a cyclic organoaminosilane precursor having the formula:
Loading the Abstract Image...
OK
First Claim
Family
Loading Family data...
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully