Heat Beam Film-Forming Apparatus
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United States of America Patent
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Issued Date -
Dec 1, 2016
app pub date -
Sep 15, 2015
filing date -
Jun 1, 2015
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Abstract
To form a film by generating molecular species which can react at a low temperature, especially, 100° C. or less at which a substrate is not deformed or altered. In a heat beam heating device which instantaneously heats a source gas to a high temperature to cause the source gas to collide with a metal wall including a catalytic function, activated molecular species are generated by a nonequilibrium reaction, sprayed on, and brought into contact with a substrate to form a film.
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