ATMOSPHERIC-PRESSURE PLASMA PROCESSING METHOD

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United States of America Patent

APP PUB NO 20160348292A1
SERIAL NO

15231229

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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Methods for atmospheric pressure plasma discharge processing using powered electrodes having elongated planar surfaces; grounded electrodes having elongated planar surfaces parallel to and coextensive with the elongated surfaces of the powered electrodes, and spaced-apart a chosen distance therefrom, forming plasma regions, are described. RF power is provided to the at least one powered electrode, both powered and grounded electrodes may be cooled, and a plasma gas is flowed through the plasma regions at atmospheric pressure; whereby a plasma is formed in the plasma regions. The material to be processed may be moved into close proximity to the exit of the plasma gas from the plasma regions perpendicular to the gas flow, and perpendicular to the elongated electrode dimensions, whereby excited species generated in the plasma exit the plasma regions and impinge unimpeded onto the material.

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Patent Owner(s)

Patent OwnerAddress
APJET INC523 DAVIS DRIVE STE 100 MORRISVILLE NC 27560

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Cornelius, Carrie E Durham, US 3 443
Roche, Gregory A Durham, US 17 1322
Tyner, David W Benson, US 3 440

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