RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING METHOD
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United States of America Patent
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May 16, 2016
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Jun 15, 2015
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Abstract
A radiation-sensitive resin composition comprises: a polymer having a structural unit that comprises an acid-labile group; a radiation-sensitive acid generator; and a salt that comprises an onium cation, and HCO3−, CO32− or a combination thereof. The onium cation is preferably a sulfonium cation, an ammonium cation, an iodonium cation, a phosphonium cation, a diazonium cation or a combination thereof. The onium cation is preferably a cation represented by formula (b-1) or formula (b-2). The acid generated from the radiation-sensitive acid generator is preferably a sulfonic acid, an imide acid, an amide acid, a methide acid or a combination thereof.
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