Substrate with multilayer reflective film, mask blank, transfer mask and method of manufacturing semiconductor device

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United States of America Patent

PATENT NO 9798050
APP PUB NO 20160377769A1
SERIAL NO

14901575

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Abstract

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A substrate with a multilayer reflective film capable of facilitating the discovery of contaminants, scratches and other critical defects by inhibiting the detection of pseudo defects attributable to surface roughness of a substrate or film in a defect inspection using a highly sensitive defect inspection apparatus.

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Patent Owner(s)

  • HOYA CORPORATION

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hamamoto, Kazuhiro Tokyo, JP 44 195
Orihara, Toshihiko Tokyo, JP 16 92

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