MONITOR PROCESS FOR LITHOGRAPHY AND ETCHING PROCESSES
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United States of America Patent
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Issued Date -
Jan 5, 2017
app pub date -
Jul 2, 2015
filing date -
Jul 2, 2015
priority date (Note) -
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Abstract
A monitor process for lithography and etching processes includes the following steps. A first lithography process and a first etching process are performed to define a first alignment mark having a first direction portion orthogonal to a second direction portion. A second lithography process is performed to overlap a part of the first direction portion as well as a part of the second direction portion, thereby maintaining an exposed area of the first alignment mark having a first corresponding direction portion and a second corresponding direction portion. A first critical dimension of the first corresponding direction portion and a second critical dimension of the second corresponding direction portion are measured.
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