CHEMICAL MECHANICAL PLANARIZATION CONDITIONER

United States of America Patent

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Jan 12, 2017
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Jun 27, 2016
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Jul 10, 2015

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Abstract

A device and method of breaking in a chemical mechanical planarization (CMP) polishing pad using multiple pad conditioners to break-in and maintain a condition of the polishing pad.

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ABRASIVE TECHNOLOGY INC	8400 GREEN MEADOWS DRIVE WESTERVILLE OH 43081

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Inventor Name	Address	# of filed Patents	Total Citations
Bubnick, Mark	Lewis Center, US	1	1
Diaz, Mark Kevin	Chandler, US	1	1
Namola, Thomas S	Columbus, US	1	1

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CHEMICAL MECHANICAL PLANARIZATION CONDITIONER

Number of patents in Portfolio can not be more than 2000

United States of America Patent

15193604

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15193604

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