SMALL MASK TILING FOR LARGER AREA DEPOSITIONS
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United States of America Patent
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Issued Date -
Jan 12, 2017
app pub date -
Mar 6, 2015
filing date -
Mar 12, 2014
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Abstract
In a method of physical vapor deposition (PVD), a first arrangement of material patterns can be deposited on different parts of a substrate in the same deposition chamber or vessel via a first number of shadow masks, or one pattern at a time can be deposited on different parts of the substrate using the same shadow mask. A second arrangement of material patterns can be deposited on different parts of the substrate in another deposition chamber or vessel via a second number of shadow masks. The each material pattern of the second arrangement of material patterns are deposited so as to not overlap a material pattern of the first arrangement of material patterns.
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