PLASMA PROCESSING APPARATUS
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United States of America Patent
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Issued Date -
Jan 12, 2017
app pub date -
Jul 7, 2016
filing date -
Jul 10, 2015
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Abstract
Disclosed is a plasma processing apparatus including: a processing container; and a partition plate made of an insulating material, having a plurality of openings, and configured to partition an inside of the processing container into a plasma generating chamber and a processing chamber. A first conductive member made of a conductive material is provided on a surface of the processing chamber side of the partition plate, and the first conductive member is applied with at least one of an AC voltage, and a DC voltage of a polarity that is opposite to a polarity of charged particles guided from the plasma generating chamber into the processing chamber through each of the openings.
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