SUBSTRATE PROCESSING SYSTEM AND PIPE CLEANING METHOD
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United States of America Patent
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Issued Date -
Jan 19, 2017
app pub date -
Feb 26, 2015
filing date -
Mar 10, 2014
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Abstract
A substrate processing system is constituted by a cleaning unit, a plurality of processing liquid supply units and a substrate processing apparatus. The cleaning unit supplies a first cleaning liquid to a processing unit of a processing liquid supply unit during cleaning of a pipe. The processing liquid supply unit stores the first cleaning liquid supplied from the cleaning unit in the processing liquid tank, and then supplies the first cleaning liquid in a processing liquid tank to the processing unit of the substrate processing apparatus through the pipe. The cleaning unit prepares a second cleaning liquid concurrently with cleaning of the pipe by the first cleaning liquid, and supplies the prepared second cleaning liquid to the processing liquid tank.
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