Method for producing solar cells having simultaneously etched-back doped regions

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United States of America Patent

PATENT NO 9923116
SERIAL NO

15124909

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Abstract

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A method for producing a solar cell is described, in which a plurality of doped regions are to be etched-back selectively or over their entire surface. Once a semiconductor substrate (1) has been provided, various doped regions (3, 5) are formed in partial regions of a surface of the semiconductor substrate, the various doped regions (3, 5) differing as regards their doping concentration and/or their doping polarity. The various doped regions (3, 5) are then purposively etched-back in order to achieve desired doping profiles, and finally electrical contacts (21) are formed at least at some of the doped regions (3, 5). The etching-back of the various doped regions takes place in a common etching operation in an etching medium. In order that such common etching-back of various doped regions (3, 5) is possible, it is proposed purposively to adjust both properties of the initially unetched doped regions (3, 5) and parameters that influence the etching operation with regard to properties of the desired doping profiles within the etched doped regions.

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Patent Owner(s)

Patent OwnerAddress
UNIVERSITAT KONSTANZUNIVERSITÄTSSTR 10 KONSTANZ 78464

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Engelhardt, Josh Constance, DE 2 5
Frey, Alexander Constance, DE 59 304
Schiele, Yvonne Constance, DE 1 0
Terheiden, Barbara Constance, DE 5 14

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