STRUCTURE PROVIDED WITH CARBON FILM AND METHOD FOR FORMING CARBON FILM
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United States of America Patent
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Jan 26, 2017
app pub date -
Jan 27, 2015
filing date -
Jan 28, 2014
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Abstract
A structure in an embodiment of the present invention includes fine unevenness structure in the surface of a carbon film independently of the shape of the surface of a substrate. This structure includes a substrate and a carbon film formed on the substrate and containing carbon or carbon and hydrogen. At least part of the surface of the carbon film has fine unevenness structure formed by applying ions and/or radicals (e.g., plasma) of oxygen and/or Ar. The fine unevenness structure has a ten point average roughness Rz of 20 nm or larger.
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