METHODS FOR PREPARING LAYERED SEMICONDUCTOR STRUCTURES AND RELATED BONDED STRUCTURES

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United States of America Patent

SERIAL NO

15191975

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Abstract

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Methods for preparing silicon-on-insulator structures and related intermediate structures are disclosed. In some embodiments, a single crystal silicon seed crystal is bonded to an amorphous silicon layer disposed on a substrate and the amorphous layer is crystallized to form a monocrystalline silicon layer.

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Patent Owner(s)

Patent OwnerAddress
GLOBALWAFERS CO LTDNO 8 INDUSTRIAL EAST ROAD 2 SCIENCE-BASED INDUSTRIAL PARK HSINCHU

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Libbert, Jeffrey L O'Fallon, US 62 623
Liu, Qingmin Glen Carbon, US 25 183
Thomas, Shawn George Chesterfield, US 31 121
Usenko, Alex O'Fallon, US 23 405
Wang, Gang Grover, US 1411 9119

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