High doped III-V source/drain junctions for field effect transistors
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United States of America Patent
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Mar 13, 2018
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app pub date -
Jul 29, 2015
filing date -
Jul 29, 2015
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Abstract
A semiconductor device includes a fin patterned in a substrate; a gate disposed over and substantially perpendicular to the fin; a pair of epitaxial contacts including a III-V material over the fin and on opposing sides of the gate; and a channel region between the pair of epitaxial contacts under the gate including an undoped III-V material between doped III-V materials, the doped III-V materials including a dopant in an amount in a range from about 1e18 to about 1e20 atoms/cm3 and contacting the epitaxial contacts.
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