PLASMA ETCHING DEVICE WITH PLASMA ETCH RESISTANT COATING

United States of America Patent

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Aug 3, 2015
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Aug 3, 2015

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Abstract

An apparatus for use in a plasma processing chamber is provided. The apparatus comprises part body and a coating with a thickness of no more than 30 microns consisting essentially of a Lanthanide series or Group III or Group IV element in an oxyfluoride covering a surface of the part body.

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LAM RESEARCH CORPORATION	4650 CUSHING PARKWAY FREMONT CA 94538

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Inventor Name	Address	# of filed Patents	Total Citations
DAUGHERTY, John	Fremont, US	72	950
HUANG, Lihua Li	Pleasanton, US	13	1096
SHIH, Hong	Santa Clara, US	104	3498
XU, Lin	Katy, US	198	5082

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PLASMA ETCHING DEVICE WITH PLASMA ETCH RESISTANT COATING

Number of patents in Portfolio can not be more than 2000

United States of America Patent

14817115

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14817115

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