Method for forming regular polymer thin films using atmospheric plasma deposition

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United States of America Patent

PATENT NO 10471465
APP PUB NO 20170050214A1
SERIAL NO

15307924

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Abstract

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The invention provides a method for forming regular polymer thin films on a substrate using atmospheric plasma discharges. In particular, the method allows for the deposition of functional polymer thin films which require a high regularity and a linear polymer structure.

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Patent Owner(s)

  • LUXEMBOURG INSTITUTE OF SCIENCE AND TECHNOLOGY (LIST)

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Boscher, Nicolas Auden le Tiche, FR 9 28
Choquet, Patrick Longeville les Metz, FR 19 81
Duday, David Luxembourg, LU 4 28
Hilt, Florian Hettange Grande, FR 3 4

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