Determination method, exposure apparatus, storage medium, and method of manufacturing article

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United States of America Patent

PATENT NO 10042266
APP PUB NO 20170052457A1
SERIAL NO

15233166

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Abstract

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The present invention provides a determination method of determining a first prediction formula for predicting a fluctuation in optical characteristics of a projection optical system while a substrate is exposed on a first exposure condition, the method comprising obtaining a correlation coefficient between the first exposure condition and a second exposure condition corresponding to a second prediction formula for predicting the fluctuation in the optical characteristics, determining, when the correlation coefficient falls within an allowable range, the first prediction formula based on the second prediction formula without actually measuring the fluctuation in the optical characteristics, and determining, when the correlation coefficient falls outside the allowable range, the first prediction formula based on a result of actually measuring the fluctuation in the optical characteristics.

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Patent Owner(s)

  • CANON KABUSHIKI KAISHA

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Arahara, Koshiro Utsunomiya, JP 3 2

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