Measurement apparatus, lithography apparatus, and method of manufacturing article
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United States of America Patent
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Oct 9, 2018
Grant Date -
Feb 23, 2017
app pub date -
Aug 8, 2016
filing date -
Aug 20, 2015
priority date (Note) -
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Abstract
The present invention provides a measurement apparatus for measuring a position of an object, comprising a reflecting portion provided on the object and having a surface on which reflectors configured to retroreflect light are arrayed, an optical system configured to cause first light to be incident on the surface, receive second light as reflected light of the first light, cause third light generated from the second light to be incident on the surface, and receive fourth light as reflected light of the third light, and a processor configured to determine the position of the object based on a detection result of the forth light, wherein the optical system is configured such that a displacement between optical paths of the first light and the second light is corrected by a displacement between optical paths of the third light and the fourth light.
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