SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
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United States of America Patent
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app pub date -
Aug 18, 2016
filing date -
Aug 19, 2015
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Abstract
According to one embodiment, a substrate processing apparatus includes a processor, a transferring part, a load lock unit, and a transfer unit. The processor performs processing of a substrate in an atmosphere. The transferring part transfers the substrate in an environment having a pressure higher than the pressure when performing the processing. The load lock unit is provided between the processor and the transferring part. The transfer unit is provided between the load lock unit and the processor. The load lock unit includes a supporter, and a drive unit. The supporter supports the substrate. The drive unit moves a position in a rotation direction of the supporter. The transfer unit transfers the substrate from the processor to the supporter partway through the processing of the substrate in the processor. The drive unit moves a position in a rotation direction of the transferred substrate.
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