IMPRINT APPARATUS, IMPRINT METHOD, AND METHOD OF PRODUCING ARTICLE
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United States of America Patent
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Issued Date -
Mar 2, 2017
app pub date -
Aug 23, 2016
filing date -
Aug 31, 2015
priority date (Note) -
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Abstract
An imprint apparatus according to an embodiment of the present invention includes a supply unit configured to supply an imprint material on a substrate, a pattern formation unit including a holder holding a mold, the pattern formation unit being configured to bring the mold in contact with the imprint material supplied by the supply unit to form a pattern, a prevention unit configured to supply a gas in a direction intersecting a direction along the substrate to prevent a foreign matter from attaching to the substrate, and a removal unit configured to locally supply a fluid to the substrate to remove a foreign matter on the substrate.
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