High Resolution Projection Micro-Stereolithography System And Method
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United States of America Patent
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Mar 2, 2017
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Nov 15, 2016
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May 28, 2010
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Abstract
A high-resolution PμSL system and method incorporating one or more of the following features with a standard PμSL system using a SLM projected digital image to form components in a stereolithographic bath: a far-field superlens for producing sub-diffraction-limited features, multiple spatial light modulators (SLM) to generate spatially-controlled three-dimensional interference holograms with nanoscale features, and the integration of microfluidic components into the resin bath of a PμSL system to fabricate microstructures of different materials.
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