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• 15 United States
• 10 France
• 8 Japan
• 7 China
• 5 Korea
• 2 Other

Patent Owner(s)

Patent Owner	Address
MITSUBISHI GAS CHEMICAL COMPANY INC	5-2 MARUNOUCHI 2-CHOME CHIYODA-KU TOKYO 100-8324
A SCHOOL CORPORATION KANSAI UNIVERSITY	3-35 YAMATE-CHO 3-CHOME SUITA-SHI OSAKA 564-8680

International Classification(s)

• C08G:MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN B....
• G03F:PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNE....

• [Classification Symbol]

• [Patents Count]

Inventor(s)

Inventor Name	Address	# of filed Patents	Total Citations
ECHIGO, Masatoshi	Tokyo, JP	132	598
KUDO, Hiroto	Osaka, JP	8	3
SATO, Takashi	Hiratsuka-shi, JP	951	9277
TOIDA, Takumi	Hiratsuka-shi, JP	21	58

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Maintenance Fees

Fee	Large entity fee	small entity fee	micro entity fee	due date
7.5 Year Payment	$3600.00	$1800.00	$900.00	Sep 2, 2024
11.5 Year Payment	$7400.00	$3700.00	$1850.00	Sep 2, 2028

Fee	Large entity fee	small entity fee	micro entity fee
Surcharge - 7.5 year - Late payment within 6 months	$160.00	$80.00	$40.00
Surcharge - 11.5 year - Late payment within 6 months	$160.00	$80.00	$40.00
Surcharge after expiration - Late payment is unavoidable	$700.00	$350.00	$175.00
Surcharge after expiration - Late payment is unintentional	$1,640.00	$820.00	$410.00

Full Text

US Patent Application No: 2017/0059,989

POLYMER COMPOUND, RADIATION SENSITIVE COMPOSITION AND PATTERN FORMING METHOD

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