Composite spacer enabling uniform doping in recessed fin devices

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United States of America Patent

PATENT NO 9620644
SERIAL NO

14843321

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Abstract

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A semiconductor device that includes at least one fin structure and a gate structure present on a channel portion of the fin structure. An epitaxial semiconductor material is present on at least one of a source region portion and a drain region portion on the fin structure. The epitaxial semiconductor material includes a first portion having a substantially conformal thickness on a lower portion of the fin structure sidewall and a second portion having a substantially diamond shape that is present on an upper surface of the source portion and drain portion of the fin structure. A spacer present on first portion of the epitaxial semiconductor material.

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Patent Owner(s)

  • INTERNATIONAL BUSINESS MACHINES CORPORATION

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Basker, Veeraraghavan S Schenectady, US 487 4272
Liu, Zuoguang Schenectady, US 156 1111
Yamashita, Tenko Schenectady, US 599 4956
Yeh, Chun-Chen Clifton Park, US 417 3463

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