METHODS AND COMPOSITIONS FOR PROCESSING DIELECTRIC SUBSTRATE

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United States of America Patent

APP PUB NO 20170066944A1
SERIAL NO

15252567

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Abstract

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Described are materials and methods for processing (polishing or planarizing) a substrate that contains pattern dielectric material using a polishing composition (aka “slurry”) and an abrasive pad, e.g., CMP processing.

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Patent Owner(s)

Patent OwnerAddress
CMC MATERIALS INC870 NORTH COMMONS DRIVE AURORA IL 60504

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
CUI, Ji Aurora, US 49 736
GRUMBINE, Steven Aurora, US 42 287
LAM, Viet Naperville, US 12 54

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