METHOD FOR CLEANING A PROCESS CHAMBER
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United States of America Patent
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Mar 9, 2017
app pub date -
Mar 17, 2015
filing date -
Mar 24, 2014
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Abstract
The disclosure relates to a method of cleaning a process chamber of a capacitively coupled plasma reactor, the method comprising: a) Introducing a gas comprising 80-100% in volume of inert gas into the process chamber, wherein said inert gas is selected from the group consisting of neon, argon, krypton, xenon and combinations thereof; and b) Forming a plasma from said inert gas, thereby cleaning said process chamber.
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