Self-organization material and pattern formation method
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United States of America Patent
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Dec 5, 2017
Grant Date -
Mar 16, 2017
app pub date -
Sep 6, 2016
filing date -
Sep 11, 2015
priority date (Note) -
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status (Latency Note)
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Abstract
A self-organization material according to an embodiment includes a block copolymer and a top coat material. The block copolymer contains a first block and a second block. The second block has a surface free energy higher than that of the first block. The top coat material contains a first portion having a surface free energy higher than that of the first block and lower than that of the second block, and a second portion having a surface free energy lower than that of the first block. The first portion is one of a homopolymer miscible with both the first block and the second block, and a random copolymer having a repeating unit of the first block and a repeating unit of the second block. The second portion is one of an organic siloxane-containing polymer and a fluorine-containing polymer.
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International Classification(s)
- H01L:SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICE....
- B82Y:SPECIFIC USES OR APPLICATIONS OF NANO-STRUCTURES; ....
- C08G:MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN B....
- B81C:PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE M....
- C09D:COATING COMPOSITIONS, e.g. PAINTS, VARNISHES, LACQ....
- G03F:PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNE....
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