Pattern data generation method, pattern data generation device, and mask
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Mar 27, 2018
Issued Date -
N/A
app pub date -
Mar 14, 2016
filing date -
Sep 14, 2015
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A pattern data generation method includes setting drawing pattern data based on design pattern data including first and second pattern regions. The drawing pattern data includes third and fourth pattern regions. The method includes setting the width of the third pattern region to a third width. The method includes setting first and second irradiation amount data based on the drawing pattern data. The method includes calculating a first thickness of the first pattern region and a second thickness of the second pattern region based on the first irradiation amount data, and calculating a third thickness of the third pattern region based on the second irradiation amount data. The method includes calculating, based on the first to third widths and the first to third thicknesses, a range of a first exposed region exposed onto a patterning substrate.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully