Mask and pattern forming method
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United States of America Patent
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Jan 30, 2018
Grant Date -
Mar 16, 2017
app pub date -
Dec 28, 2015
filing date -
Sep 11, 2015
priority date (Note) -
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status (Latency Note)
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Abstract
According to one embodiment, a mask includes a substrate, first and second pattern portions. The substrate includes a first surface, and the substrate is light transmissive. The first pattern portion includes first optical members. The first optical members are provided on the first surface. A light transmittance of the first optical members is lower than a light transmittance of the substrate. A distance between the adjacent two first optical members is a first distance. The second pattern portion includes second optical members. The second optical members are provided on the first surface. A light transmittance of the second optical members is lower than the light transmittance of the substrate. A distance between the adjacent two second optical members is a second distance. A first phase of a light penetrating the first pattern portion is different from a second phase of a light penetrating the second pattern portion.
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