BIPOLAR PLATE WITH FORCE CONCENTRATOR PATTERN
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United States of America Patent
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Issued Date -
Mar 23, 2017
app pub date -
Sep 20, 2016
filing date -
Sep 21, 2015
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Abstract
Embodiments of present disclosure are directed to a bipolar plate assembly. The bipolar plate assembly has a frame and a base. At least one of the frame and the base has a shape of a force concentrator pattern or has a first surface having a force concentrator pattern, the force concentrator pattern including a raised surface extending partially across the first surface. A surface area of the force concentrator pattern across the length of the frame or base is generally constant, thereby producing a uniform compressive pressure along the length of the frame or base when the bipolar plate assembly is under compression.
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