Backscattered electrons (BSE) imaging using multi-beam tools
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United States of America Patent
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Oct 29, 2019
Grant Date -
Mar 23, 2017
app pub date -
Aug 24, 2016
filing date -
Sep 23, 2015
priority date (Note) -
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Abstract
Multi-beam scanning electron microscope inspection systems are disclosed. A multi-beam scanning electron microscope inspection system may include an electron source and a beamlet control mechanism. The beamlet control mechanism may be configured to produce a plurality of beamlets utilizing electrons provided by the electron source and deliver one of the plurality of beamlets toward a target at a time instance. The multi-beam scanning electron microscope inspection system may also include a detector configured to produce an image of the target at least partially based on electrons backscattered out of the target.
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