ACTIVATED THIN SILICON LAYERS
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United States of America Patent
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Sep 29, 2015
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Sep 29, 2015
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Abstract
A method for forming a layer of material on a silicon layer comprises depositing a layer of silicon material having a hydrophobic H-terminated surface on a substrate, forming a hydrophilic seed layer on the surface of the silicon material, and depositing an oxide material layer on the hydrophilic seed layer.
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