METHOD FOR FORMING LaNiO3 THIN FILM

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United States of America Patent

SERIAL NO

15128038

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Abstract

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A method for forming a LaNiO3 thin film is provided, the method including: a step of forming a coating film by coating a substrate surface which is coated with a Pt electrode with a LaNiO3 thin film-forming liquid composition and drying the LaNiO3 thin film-forming liquid composition in a state where amounts of H2, H2O, and CO adsorbed on the substrate surface per 1 cm2 are 1.0×10−10 g or less, 2.7×10−10 g or less, and 4.2×10−10 g or less, respectively; a step of pre-baking the coating film; and a step of forming a LaNiO3 thin film by baking the pre-baked coating film.

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Patent Owner(s)

Patent OwnerAddress
MITSUBISHI MATERIALS CORPORATION2-3 MARUNOUCHI 3-CHOME CHIYODA-KU TOKYO 100-8117

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Fujii, Jun Naka-gun, JP 32 462
Sakurai, Hideaki Naka-gun, JP 173 506
Soyama, Nobuyuki Naka-gun, JP 73 295

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