SYSTEM AND METHOD FOR OBTAINING FORCE BASED ON PHOTOELASTICITY

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United States of America Patent

APP PUB NO 20170102277A1
SERIAL NO

15316033

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Abstract

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A method and system for obtaining force are provided, wherein the system includes a block made of a photoelastic material having multiple surfaces including a first surface on which an object is exerting the force to the block, and one or more polariscopes configured around the block, and wherein the method includes measuring photoelastic intensities by using three polariscopes simultaneously and obtaining each set of the photoelastic intensities sequentially in time to obtain a sequence of measured photoelastic intensities, and obtaining the force by using an optimization method based on the quantity associated with the difference between the measured and predicted photoelastic intensities.

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Patent Owner(s)

Patent OwnerAddress
OKINAWA INSTITUTE OF SCIENCE AND TECHNOLOGY SCHOOL CORPORATIONKUNIGAMI-GUN OKINAWA 904-0495

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Bandi, Mahesh Maruthi Kunigami-gun, JP 1 1
Mandre, Shreyas Dilip Providence, US 1 1
Venkadesan, Madhusudhan Bangalore, IN 1 1

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