Embedded noble metal electrodes in microfluidics

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United States of America Patent

PATENT NO 9804122
SERIAL NO

14952161

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Abstract

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A technique relates to manufacturing a nanogap. An oxide layer is disposed on top of a substrate. A release layer is disposed in a pattern on top of the oxide layer. A patterned trench is etched into the oxide layer using the pattern of the release layer. A metal layer is disposed on the release layer and in the patterned trench. A polish removes the release layer, thereby removing both the release layer and a portion of the metal layer having been disposed on top of the release layer, such that the metal layer remaining includes a first metal part and a second metal part connected by a metal nanowire. The metal layer remaining is coplanar with the oxide layer. A nanochannel is formed in the oxide layer in a region of the metal nanowire. The nanogap is formed in the metal nanowire separating the first and second metal parts.

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Patent Owner(s)

  • BIONANO GENOMICS, INC.;INTERNATIONAL BUSINESS MACHINES CORPORATION

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hu, Huan Yorktown Heights, US 50 105
Lofaro, Michael F Brookfield, US 43 674
Smith, Joshua T Croton on Hudson, US 152 751
Solis, Daniel J Escondido, US 20 218
Wunsch, Benjamin H Mt. Kisco, US 52 336

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