Porous Polishing Pad and Preparing Method of the Same

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United States of America Patent

APP PUB NO 20170129072A1
SERIAL NO

15343846

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Abstract

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The present disclosure relates to a porous polishing pad including pores formed by a reaction between a prepolymer and a saccharide material, and a method of preparing the porous polishing pad.

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Patent Owner(s)

Patent OwnerAddress
FNS TECH CO LTD246 SINGAL-RI JIKSAN-EUP SEOBUK-GU CHEONAN-SI CHUNG-NAM

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kim, Pal-Kon Cheonan-si, KR 4 11
Kim, Sub Cheonan-si, KR 1 0
Park, Jong Ho Cheonan-si, KR 101 391

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