DIAPHRAGM VALVE, FLUID CONTROL DEVICE, SEMICONDUCTOR MANUFACTURING APPARATUS, AND SEMICONDUCTOR MANUFACTURING METHOD

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May 11, 2017
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Jun 17, 2015
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Jun 30, 2014

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Abstract

A flat portion of a bottom surface of a depression of a body is provided with a spot facing so as to include a portion of a fluid outflow channel, which portion is open to the bottom surface of the depression.

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Patent Owner	Address
FUJIKIN INCORPORATED	3-2 ITACHIBORI 2-CHOME NISHI-KU OSAKA-SHI OSAKA 550-0012

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Inventor Name	Address	# of filed Patents	Total Citations
Shikata, Izuru	Osaka-shi, JP	23	578
Watanabe, Kazunari	Osaka-shi, JP	55	399

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DIAPHRAGM VALVE, FLUID CONTROL DEVICE, SEMICONDUCTOR MANUFACTURING APPARATUS, AND SEMICONDUCTOR MANUFACTURING METHOD

Number of patents in Portfolio can not be more than 2000

United States of America Patent

15322553

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15322553

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