POLISHING COMPOSITION AND POLISHING METHOD USING THE SAME

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United States of America Patent

SERIAL NO

15127294

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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The present invention provides a polishing composition with which differences in height of a SiN film can be sufficiently removed.

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Patent Owner(s)

Patent OwnerAddress
FUJIMI INCORPORATED1-1 CHIRYO 2-CHOME NISHIBIWAJIMA-CHO KIYOSU-SHI AICHI 452-8502

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
SHINODA, Toshio Kiyosu-shi, Aichi, JP 12 9

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