METALLIC FILM AND MANUFACTURING METHOD OF METALLIC FILM

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United States of America Patent

SERIAL NO

15321995

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Abstract

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A metallic film includes an indium layer formed on a base material surface, where a mean area of an indium particle configuring the indium layer is equal to or smaller than 20000 nm2. A manufacturing method of the metallic film includes an indium film formation process forming an indium layer on the base material surface by vapor-depositing indium on the base material surface, where in the indium film formation process, the indium is vapor-deposited on the base material surface in a state where a temperature of the base material surface is heated to a predetermined temperature.

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Patent Owner(s)

Patent OwnerAddress
AISIN SEIKI KABUSHIKI KAISHA1 ASAHI-MACHI 2-CHOME KARIYA-SHI AICHI-KEN 448-8650

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
HARA, Takashi Obu-shi, JP 95 1217
KATAYAMA, Kosuke Takahama-shi, JP 3 1

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