EUV photopatterning of vapor-deposited metal oxide-containing hardmasks

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United States of America Patent

PATENT NO 9996004
SERIAL NO

14948109

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Abstract

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A vacuum-integrated metal oxide-containing hardmask formation process and related vacuum-integrated hardware that combine steps of film formation by vapor deposition and optical lithography results in direct photopatterning of metal oxide-containing hardmasks at substantially reduced cost relative to current approaches.

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Patent Owner(s)

Patent OwnerAddress
LAM RESEARCH CORPORATION4650 CUSHING PARKWAY FREMONT CA 94538

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hausmann, Dennis M Lake Oswego, US 71 8787
Smith, David Lake Oswego, US 499 9682

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