EPITAXIAL STRUCTURE AND EPITAXIAL GROWTH METHOD FOR FORMING EPITAXIAL LAYER WITH CAVITIES

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United States of America Patent

SERIAL NO

15428128

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Abstract

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An epitaxial structure includes a substrate, a first epitaxial layer and a second epitaxial layer. The substrate has a surface, and the first epitaxial layer is disposed over the substrate and defines a plurality of stepped air voids and an opening over each of the stepped air voids. The second epitaxial layer is disposed on the first epitaxial layer and collectively defines the stepped air voids with the first epitaxial layer.

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Patent Owner(s)

Patent OwnerAddress
LEXTAR ELECTRONICS CORPORATION6F NO 21 LIXING RD HSINCHU SCIENCE PARK HSINCHU 300094

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
CHEN, Jun-Rong Hsinchu County, TW 25 43
CHOU, Hsiu-Mei Hsinchu City, TW 10 15
YE, Jhao-Cheng Yunlin County, TW 7 14

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