FILM-FORMING APPARATUS
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United States of America Patent
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Jun 1, 2017
app pub date -
Oct 20, 2016
filing date -
Nov 30, 2015
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Abstract
Source gases are instantaneously heated, at least two kinds of generated gas molecular species generated by instantaneously heating the source gases are independently introduced and brought into contact with a substrate having a temperature lower than heating temperature of the instantaneously-heating mechanism for source gas to form a first compound film and to form a second compound film containing at least one element of elements contained in the first compound film, and a multilayer film composed of at least the first compound film and the second compound film is produced.
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