Resin composition for underlayer film formation, layered product, method for forming pattern, imprint forming kit, and process for producing device

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United States of America Patent

PATENT NO 10246605
APP PUB NO 20170158905A1
SERIAL NO

15441716

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Abstract

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Provided are a resin composition for underlayer film formation with which a variation hardly occurs in the line width distribution after processing due to a small thickness of a residual film after mold pressing, a layered product, a method for forming a pattern, an imprint forming kit, and a process for producing a device.

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Patent Owner(s)

  • FUJIFILM CORPORATION

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Goto, Yuichiro Haibara-gun, JP 44 121
Kitagawa, Hirotaka Haibara-gun, JP 43 228
Oomatsu, Tadashi Haibara-gun, JP 17 97

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