FUNCTIONAL FILM MANUFACTURING METHOD AND FUNCTIONAL FILM
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United States of America Patent
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Issued Date -
Feb 18, 2016
app pub date -
Aug 13, 2014
filing date -
Feb 15, 2012
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Abandoned
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Abstract
An organic layer not containing halogen is formed on a substrate using a coating material, and a silicon nitride layer is formed on the organic layer by plasma CVD. Owing to the configuration, there is provided a functional film manufacturing method capable of stably manufacturing a high-performance functional film such as a gas barrier film having excellent gas barrier properties, as well as a functional film.
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