SILVER-ALLOY BASED SPUTTERING TARGET

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United States of America Patent

SERIAL NO

15327109

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Abstract

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The present invention relates to a sputtering target comprising a silver alloy that contains 5-25% by weight of palladium, based on the total amount of silver alloy, and has a mean grain size in the range of 25-90 μm.

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Patent Owner(s)

Patent OwnerAddress
MATERION ADVANCED MATERIALS GERMANY GMBH63755 ALZENAU

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Herzog, Andreas Bruchkobel, DE 12 31
Konietzka, Uwe Geiselbach, DE 12 50
Schlott, Martin Offenbach, DE 26 97
Scholl, Thomas Rodgau, DE 169 3711

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