METAL PATCH, METHOD FOR MANUFACTURING THE SAME AND BONDING METHOD BY USING THE SAME

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United States of America Patent

SERIAL NO

14977639

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Abstract

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A metal patch suitable for connecting a high-power element and a substrate is provided. The metal patch includes an intermediate metal layer, two first metal layers, and two second metal layers. The first metal layers are respectively disposed on two opposite surfaces of the intermediate metal layer. The intermediate metal layer is located between the first metal layers. The melting point of each of the first metal layers is greater than 800° C. The second metal layers are respectively disposed on the first metal layers. The intermediate metal layer and the first metal layers are located between the second metal layers. The material of each of the second metal layers includes an indium-tin alloy. Each of the first metal layers and the corresponding second metal layer can generate an intermetal via a solid-liquid diffusion reaction.

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Patent OwnerAddress
INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE195 SEC 4 CHUNG HSING RD CHUTUNG HSINCHU 310401

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chou, Min-Chieh Taipei City, TW 43 500
Huang, Meng-Chi Taoyuan City, TW 19 31
Huang, Yi-Hao Taoyuan City, TW 8 11
Zhang, Wen-Hua Hsinchu County, TW 5 6

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