COATING APPARATUS FOR CONTINUOUSLY FORMING A FILM THROUGH CHEMICAL VAPOR DEPOSITION
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United States of America Patent
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Issued Date -
Jul 6, 2017
app pub date -
Dec 30, 2015
filing date -
Dec 30, 2015
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Abstract
A coating apparatus for continuously forming a film through chemical vapor deposition (CVD) includes a conveyor unit for conveying a substrate along a moving path, a deposition unit and a film formation-prohibiting unit. The deposition unit is disposed on the moving path and includes a deposition chamber adapted for receiving the substrate and forming a film on the substrate through CVD. The film formation-prohibiting unit includes a heating mechanism that is disposed in the deposition chamber for maintaining the conveyor unit at a film formation-prohibiting temperature.
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