Substrate support, method for loading a substrate on a substrate support location, lithographic apparatus and device manufacturing method

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 10656536
APP PUB NO 20170192359A1
SERIAL NO

15308598

Stats

ATTORNEY / AGENT: (SPONSORED)

Importance

Loading Importance Indicators... loading....

Abstract

See full text

A substrate support, includes: a substrate support location configured to support a substrate, and a vacuum clamping device configured to clamp the substrate on the substrate support location, wherein the vacuum clamping device includes at least one reduced pressure source to create a reduced pressure, at least one vacuum section connected to the at least one reduced pressure source, wherein the at least one vacuum section is configured to attract the substrate towards the substrate support location, and a control device configured to control a spatial pressure profile along the at least one vacuum section with which the substrate is attracted by the vacuum clamping device, wherein the control device includes a substrate shape data input to receive substrate shape data representing shape data of the substrate to be clamped, and wherein the control device is configured to adapt the spatial pressure profile in dependency of the substrate shape data.

Loading the Abstract Image... loading....

First Claim

See full text

Family

Loading Family data... loading....

Patent Owner(s)

  • ASML NETHERLANDS B.V.

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
De, Kruijf Niek Elout Eindhoven, NL 3 16
Dusa, Mircea San Jose, US 35 1215
Gerritzen, Justin Johannes Hermanus Eindhoven, NL 9 10
Houben, Martijn 's-Hertogenbosch, NL 33 216
Leenders, Martinus Hendrikus Antonius Rhoon, NL 133 1417
Mulder, Johannes Gerardus Maria Eindhoven, NL 1 2
Poiesz, Thomas Veldhoven, NL 23 34
Soethoudt, Abraham Alexander Eindhoven, NL 20 37
Van, Den Heuvel Marco Adrianus Peter Waalre, NL 8 25
Van, Dongen Paul Eindhoven, NL 6 4
Verweij, Antonie Hendrik Dussen, NL 9 8

Cited Art Landscape

Load Citation

Patent Citation Ranking

Forward Cite Landscape

Load Citation

Maintenance Fees

Fee Large entity fee small entity fee micro entity fee due date
3.5 Year Payment $1600.00 $800.00 $400.00 Nov 19, 2023
7.5 Year Payment $3600.00 $1800.00 $900.00 Nov 19, 2027
11.5 Year Payment $7400.00 $3700.00 $1850.00 Nov 19, 2031
Fee Large entity fee small entity fee micro entity fee
Surcharge - 3.5 year - Late payment within 6 months $160.00 $80.00 $40.00
Surcharge - 7.5 year - Late payment within 6 months $160.00 $80.00 $40.00
Surcharge - 11.5 year - Late payment within 6 months $160.00 $80.00 $40.00
Surcharge after expiration - Late payment is unavoidable $700.00 $350.00 $175.00
Surcharge after expiration - Late payment is unintentional $1,640.00 $820.00 $410.00