Substrate support in a millisecond anneal system

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United States of America Patent

PATENT NO 10734262
APP PUB NO 20170194178A1
SERIAL NO

15378509

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Abstract

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Systems and methods for substrate support in a millisecond anneal system are provided. In one example implementation, a millisecond anneal system includes a processing chamber having a wafer support plate. A plurality of support pins can extend from the wafer support plate. The support pins can be configured to support a substrate. At least one of the support pins can have a spherical surface profile to accommodate a varying angle of a substrate surface normal at the point of contact with the substrate. Other example aspects of the present disclosure are directed to methods for estimating, for instance, local contact stress at the point of contact with the support pin.

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Patent Owner(s)

Patent OwnerAddress
MATTSON TECHNOLOGY INC47131 BAYSIDE PARKWAY FREMONT CA 94538
BEIJING E-TOWN SEMICONDUCTOR TECHNOLOGY CO LTDNO 8 BUILDING NO 28 JINGHAI ER RD ECONOMIC AND TECHNICAL DEVELOPMENT ZONE BEIJING 100176

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Cibere, Joseph Burnaby, CA 22 118

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