Deposition apparatus

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United States of America Patent

PATENT NO 10917960
APP PUB NO 20170202077A1
SERIAL NO

15395200

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A deposition apparatus includes a plasma generator for generating a plasma by arc discharge, and a deposition unit for forming a film on a member by the plasma generated by the plasma generator. The plasma generator includes a target holder for holding a target and applying a negative potential to the target, an anode to which a positive potential is applied, and a capture for capturing droplets from the target. The anode has an opening, and the capture is arranged in the opening.

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Patent Owner(s)

  • CANON ANELVA CORPORATION

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Atsumi, Masahiro Fuchu, JP 8 43
Nishimura, Hidekazu Hachioji, JP 5 10
Shibamoto, Masahiro Hachioji, JP 30 122
Yakushiji, Hiroshi Tokyo, JP 18 80

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