RPS defect reduction by cyclic clean induced RPS cooling

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United States of America Patent

PATENT NO 10755903
APP PUB NO 20170207069A1
SERIAL NO

15397883

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Abstract

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A method of cleaning a remote plasma source includes supplying a first cycle of one or more first cleaning gases to a remote plasma source. The method includes supplying a second cycle of one or more second cleaning gases to the remote plasma source. The method includes supplying one or more cooling fluids to one or more cooling conduits coupled with the remote plasma source.

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Patent Owner(s)

  • APPLIED MATERIALS INC.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Balasubramanian, Ganesh Sunnyvale, US 134 3058
Bhatia, Sidharth Santa Cruz, US 26 713
Kojiri, Hidehiro Sunnyvale, US 17 184
Patel, Anjana M San Jose, US 12 939
Suh, Song-Moon Sunnyvale, US 28 487
Zuo, Zhili Santa Clara, US 5 6

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